Gladkih

 The article deals with methods of dummy-structure allocation on the patterns of topological layers of VLSIC, allowing to minimize the crystal surface remanent relief when creating multilayer metal coating. These methods are based both on simulation of chemico-mechenical planarization operation (CMP) (MBDF) and usage of filling rules (RBDF). The authors present an algorithm of calculation of local density of VLSIC topological layer filling. This local density filling was used in the method of topology filling with dummy-figures based on simulation of CMP operation.